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Plasma-Therm Technical Workshop: Fundamentals of Plasma Processing (Etching and Deposition)

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Plasma-Therm Technical Workshop: Fundamentals of Plasma Processing (Etching and Deposition)


The workshop will focus on the fundamentals of plasma etching and deposition. Lectures will include the basics of plasma reactors and mechanisms for etching and deposition and review state-of-the-art etching and deposition technologies as applied to semiconductor, MEMS, and nanofabrication. Talks will cover compound semiconductor, dielectric, and deep silicon etching as well as PECVD and high density plasma CVD of silicon based materials. Fundamental and new ideas for endpoint detection and sample thermal budget management will be presented.



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Map Lehman Auditorium (SEH-B1220), George Washington University Science and Engineering Hall, 800 22nd St NW, Washington, United States
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